Worked example: phosphorus-doped silicon
Semiconductor Devices · Intrinsic & Extrinsic · Example
A silicon sample is doped with phosphorus atoms. Find the majority-carrier density, the minority-carrier density (using the mass-action law with ), and label the type.
- Given. Donor concentration , intrinsic carrier density at 300 K. Phosphorus is a group V atom, so it acts as a donor — every ionised P contributes one free electron.
- Equation. Mass-action law and the full-ionisation approximation:
- Substitution. Take cm⁻³ directly from the donor count, then rearrange the mass-action law for :
- Result. (electrons, majority) and (holes, minority). This sample is strongly n-type.
- Sanity-check. Electrons outnumber holes by a factor of , so essentially all the current is carried by electrons — exactly what we expect from an n-type material. And the minority concentration cm⁻³ is six orders of magnitude below the intrinsic value, just as the mass-action law demands when is six orders above it.
One impurity atom in roughly Si atoms is enough to convert silicon from intrinsic () to strongly n-type with cm⁻³. The mass-action law then pins the minority concentration without us doing anything else.
Try it yourself in the Simulate stage — drop a few P or B atoms into the lattice and watch the majority flag flip between n-type and p-type as you go.